welcome,guest
Home » Products »
TitleProduct

Titanium sputtering target, high purity, monolithic, rotatable, rotary, cylindrical, planar, cathodi

  • Price:

    Negotiable

  • minimum:

  • Total supply:

  • Delivery term:

    The date of payment from buyers deliver within days

  • seat:

    Shaanxi

  • Validity to:

    Long-term effective

  • Last update:

    2017-08-15 13:55

  • Browse the number:

    523

Send an inquiries

Company Profile

Haohai Metal Materials Co.,Ltd ( Haohai Titanium )

By certification [File Integrity]

Contact: haohaijinshu(Mr.)  

Email:

Telephone:

Phone:

Area: Shaanxi

Address: Shaanxi

Website: http://www.pvdtarget.com/ http://www.chinasatcomgm.com/com/haohaijinshu/

Product details
Titanium Sputtering Target, High Purity, Monolithic, Rotatable (rotary, Cylindrical), Planar (rectangle), Cathodic ARC, PVD Coating, Thin Film Deposition, Magnetron Ti Sputtering Targets


TITANIUM SPUTTERING TARGET


Haohai Metal as a top class manufacturer for Titanium and Titanium alloys over 18 years, many companies turn to Haohai for Titanium and Titanium alloys because they consider us the most reliable vendor they trust to provide high quality titanium products that meet or exceed their specifications.

 

Haohai Sputtering Targets as the target materials division (TMD) of Haohai Metal, with a modern, well equipped plant and invaluable knowledge about titanium material, options and applications, we provides specialty metal(especially titanium) thin film PVD materials in a wide variety of sputtering target configurations according to client's requirements. Material properties and forms are optimized for individual chamber types and deposition processes.


Our in-house material synthesis and manufacturing operations enable us to provide market-leading value in sputtering targets.


Haohai titanium sputtering targets include titanium monolithic rotary sputtering targets, planar sputtering targets and cathodic targets.




Titanium Monolithic Rotatable (Rotary, Cylindrical) Sputtering Target

 

Manufacturing Range

OD (mm)

ID (mm)

Length (mm)

Custom Made

50 - 300

30 - 280

100 - 4000

 

Specification

Composition

Ti

Purity

CP Grade 2 (99.5%), CP Grade 1 (99.7%),                                                               

3N5 (99.95%), 4N (99.99%), 4N5 (99.995%)

Density

4.51 g/cm3

Grain Sizes

< 80 micron or on request

Fabrication Processes

Vacuum Melting, Forging, Extruding, Machining

Shape

Straight, Dog Bone

End Types

SCI, SRF, DSF, RFF, WFF, VA, GPI Ends Fixation, Spiral Groove, Custom Made

Surface

Ra 1.6 Micron or on request

 

Other Specification

Vapor degreased and demagnetized after final machining.

ID to be HONED and OD GROUND after raw tube is produced to ensure ID to OD concentricity meets drawing requirements.

 High vacuum tight, leak rate at any location not to exceed 1 x 10-8 STD CC/SEC.

 Sealed in plastic, wrapped in foam to protect, and ends capped to protect seal surfaces.

 

Normal Sizes

Titanium Rotary 

Sputtering Target

Normal Sizes Backing Tubes

  55mm ID x   70mm OD x 1334mm Long

  80mm ID x 100mm OD x                Long

125mm ID x 153mm OD x   576mm Long

125mm ID x 153mm OD x   800mm Long

125mm ID x 153mm OD x   895mm Long

125mm ID x 155mm OD x   895mm Long

125mm ID x 153mm OD x 1172mm Long

125mm ID x 153mm OD x 1676mm Long

125mm ID x 153mm OD x 1940mm Long

125mm ID x 153mm OD x 1994mm Long

125mm ID x 153mm OD x 2420mm Long

125mm ID x 153mm OD x 3191mm Long

125mm ID x 153mm OD x 3852mm Long

125mm ID x 153mm OD x                Long

125mm ID x 180mm OD x   624mm Long

194mm ID x 219mm OD x 2301mm Long

  80mm ID x   88.0mm OD x                   Long

125mm ID x 133.0mm OD x 1940.0mm Long

125mm ID x 132.5mm OD x 3200.4mm Long

125mm ID x 132.5mm OD x                   Long

 

Compared to titanium planar configurations, Haohai titanium cylindrical sputtering targets offer:

 Larger erosion zones that provide 2 to 2.5 times the material utilization.

 Longer target life that reduces the frequency of downtime for changeouts and chamber maintenance.

 Custom manufacturing in monolithic, segmented or thermal spray formats.

 End features that are precision machined for individual cathode system designs.

 Reduce the cost of ownership for large area coating operations.

 Variety of materials including.

 Optimum grain size and uniform microstructure assure consistent process performance through full end of life.

 Complete homogeneity and high purity levels produce consistent coverage.

 Able to supply materials to any size operation from R&D to full-scale production.




Titanium Planar (Rectangle, Circular) Sputtering Target

 

Haohai standard planar sputtering targets for thin film are available monolithic or bonded with planar target dimensions and configurations up to 2000 mm with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devices as well as the latest process equipment.


Manufacturing Range

Rectangle

Length (mm)

Width (mm)

Thickness (mm)

Custom Made

10 - 2000

10 - 1200

1.0 - 50.8

Circular

Diameter (mm)


Thickness (mm)

10 - 1000


1.0 - 100

 

Specification

Composition

Ti, Ti6Al4V Grade 5

Purity

CP Grade 2 (99.5%), 

3N (99.9%), 3.5N (99.95%), 4N (99.99%), 4.5N (99.995%),   5N (99.999%)

Density

4.51 g/cm3

Grain Sizes

< 80 micron or on request

Fabrication Processes

Vacuum Melting, Forging, Rolling, Machining

Shape

Plate, Disc, Step, Down bolting, Threading, Custom Made

Type

Monolithic, Multi-segmented Target, Bongding

Surface

Ra 1.6 micron

 

Other Specifications

Rectangle target

Rolled Plates, per ASTM B265

For rectangle targets, we cut big plates into sizes by water jet, to make sure the composition, mechanical properties and the grain structure of every part in the same batch is homogeneous and consistent. We can supply the layout of the master plate, our customer can trace the position of every part by our marking system.

 

Circular Target

Rolled bars, per ASTM B348

For the circular targets, we cut long bars into sizes by wire-electrode cutting, to make sure the composition, mechanical properties and the grain structure of every part in the same batch is homogeneous and consistent, we can supply the layout of the master bar, our customer can trace the position of every part by our marking system.


We make sure the same grain direction in the multi-segmented construction parts.

Flatness, clean surface, polished, free of crack, oil, dot, etc.




Titanium Arc Cathodes

We supply rotary and planar arc cathodes as well as rotary and planar sputtering targets



For Haohai titanium sputtering target and arc cathodes:


Tolerance

Acc. to drawings or on request.


Impurities Content [ppm]

Purity [%]

Elements

Grade 2

[99.5]

Grade 1

[99.7]

3N5

[99.95]

4N5

[99.995]

Metallic Impurities [μg/g]

Ag

-

-

0.4

0.05

As

-

-

0.5

003

Al

-

-

http://www.pvdtarget.com/